Come and see us at the Design Automation Conference (DAC) in San Francisco July 27 through July 30. We are booth number 1522.
-
Headlines
Categories
Meta
ViASIC’s Place and Route Technology Chosen by Achronix Semiconductor
Technology used as Place & Route functionality for Achronix CAD Environment
October 8, 2008
RESEARCH TRIANGLE PARK, N.C. – Oct. 7, 2008 – ViASIC Inc., an electronic design automation (EDA) company with breakthrough tools, IP and services for reconfigurable semiconductor fabrics, today announced that Achronix Semiconductor Corp. selected ViASIC’s ViaPath™ place and route software for use in its Achronix CAD environment (ACE). ViASIC believes ViaPath is the only commercially [...] Read More »
ViASIC Names J. Mark Goode as President and Chief Executive Officer
Top Standard Metal Configurable Fabric Company Promotes Industry Veteran to Guide Next Level of Business Development
March 3, 2008
RESEARCH TRIANGLE PARK, N.C. – Mar. 3, 2008 – ViASIC Inc., an electronic design automation (EDA) company that offers breakthrough tools, IP and services for reconfigurable semiconductor fabrics, today announced the promotion of J. Mark Goode to president and chief executive officer, effective immediately. Goode brings 17 years of solid experience to this role, spanning [...] Read More »
ViASIC Names Lynn Hayden President and CEO
Top Reconfigurable Semiconductor Fabric Company Taps Industry Veteran to Oversee Growth
September 19, 2007
RESEARCH TRIANGLE PARK, N.C. – Sept. 13, 2007 - ViASIC Inc., an electronic design automation (EDA) company that offers breakthrough tools, IP and services for reconfigurable semiconductor fabrics, today announced the appointment of Lynn Hayden as president and chief executive [...] Read More »
Subject: ViASIC ViaPath/ViaMask Deep Chip #
Structured ASICs are "not dead yet" Cooley's Wiretap #
DAC Preview: Physical Design and Analysis Electronic Design #
Configurable SoCs speed turnaround EE Times #
ViASIC Introduces Industry’s First Two-Mask Standard Metal Fabric for Re-configurable SOC Design
DuoMask patented technology provides a complete solution for all processes
June 30, 2006
Research Triangle Park, NC – June 30, 2006 – ViASIC, Inc., the leading provider of standard-metal technologies, today announced DuoMask, a high-density, high performance two-layer standard-metal fabric for [...] Read More »